Uv-resistant microbes and uv-blocking microbial extract

ABSTRACT

The present disclosure relates to a composition including an extract from an  Acidithiobacillus  bacteria or a yeast extracted after exposure of the bacteria to UV radiation. The disclosure further relates to a method of preparing a UV-blocking composition by exposing a culture of  Acidithiobacillus  or yeast to UV radiation and extracting UV-blocking cellular material produced in response to the UV radiation from the  Acidithiobacillus  or yeast. The disclosure further relates to a method of protecting an item from UV radiation damage by extracting UV-blocking cellular material from  Acidithiobacillus  or yeast exposed to UV radiation and covering the item with the UV-blocking cellular material. The disclosure further relates to a UV-resistant yeast cell and a UV-resistant bacterial cell.

PRIORITY CLAIM

The present application claims priority under 35. U.S.C. §119 to U.S.Provisional Patent Application Ser. No. 61/738,117, filed Dec. 17, 2012,the contents of which is incorporate by reference herein in itsentirety.

STATEMENT OF GOVERNMENT INTEREST

Portions of the current invention were developed using US governmentfunding provided under NASA-NAG 9-1241 and SynBERC-NSF-University ofCalifornia-Berkeley-1385638, and by the USDA under Evans-Allen-PrairieView grant 2011-33100-8916. Accordingly, the US government has certainrights in the invention. The invention described herein was also made byan employee of the United States Government and may be manufactured andused by or for the Government of the United States of America forgovernmental purposes without the payment of any royalties thereon ortherefor.

TECHNICAL FIELD

The present disclosure relates to engineered microbes, such as bacteriaand yeast, that are resistant to ultraviolet (UV) radiation damage. Thepresent disclosure also relates to UV-protective microbial extracts thatmay be prepared from such engineered microbes or from microbes exposedto UV radiation. The disclosure further relates to methods using thesemicrobes or extracts, such as fermentation processes and methods ofprotecting agricultural plants or other materials from UV radiation.

BACKGROUND

Exposure to UV radiation causes harmful effects in a wide variety ofthings, both living and non-living. For example, exposure of human skinto UV radiation can cause sever sunburn and skin cancer and exposure ofbeneficial microorganisms to UV radiation can kill them. UV radiationcan also cause materials to degrade prematurely and thus suffermechanical failure or otherwise become unable to serve their intendedpurpose.

The harmful effects of UV radiation can generally be prevented tolessened through the simple step of absorbing all or a portion of UVradiation before it reaches the thing it may harm. For, example,chemicals in sunscreen absorb a portion of the UV radiation that wouldnormally reach the skin and, as a result, help protect the skin fromsunburn and skin cancer.

Although numerous substances able to absorb UV radiation are known, notall of them are suitable for all possible uses. Further, some substancesmay be expensive to produce or may have harmful side effects, such astoxicity or undesired chemical reactions with a protected material.Other substances simply do not last long enough in the environment inwhich they are used or last too long.

Accordingly, there is a demand for new substances able to absorb UVradiation, particularly if those substances are biocompatible.

SUMMARY

The present disclosure relates to a composition including an extractfrom an Acidithiobacillus bacteria or a yeast extracted after exposureof the bacteria to UV radiation.

The disclosure further relates to a method of preparing a UV-blockingcomposition by exposing a culture of Acidithiobacillus or yeast to UVradiation and extracting UV-blocking cellular material produced inresponse to the UV radiation from the Acidithiobacillus or yeast.

The disclosure further relates to a method of protecting an item from UVradiation damage by extracting UV-blocking cellular material fromAcidithiobacillus or yeast exposed to UV radiation and covering the itemwith the UV-blocking cellular material.

The disclosure further relates to a UV-resistant yeast cell including aplasmid comprising a nucleic acid encoding at least one of a Msn4pn, aruvB, a heat shock protein, an alcohol dehydrogenase (ADH) protein, aNADH-cytochrome b5 reductase 2, a NADP-specific glutamate dehydrogenase,a superoxide dismutase, a hexokinase protein, or a phosphate glyceratemutase under control of a constitutive or inducible promoter.

The disclosure further relates to a UV-resistant bacterial cellincluding a plasmid comprising a nucleic acid encoding at least one of amajor outer membrane protein, a RuBisCO large subunit 1 or 2, aphosphoribulokinase, a Ketol-acid reductoisomerase, a pyridinenucleotide-disulfide oxoreductase, a methionine synthase, or amethyltransferase under control of a constitutive or inducible promoter.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the present invention may be better understood throughreference to the following figures in which:

FIG. 1 illustrates a plasmid that may be used to produce and located ina UV-resistant yeast.

DETAILED DESCRIPTION

The present disclosure relates to engineered microbes, such as bacteriaand yeast, that are resistant to ultraviolet (UV) radiation damage. Thepresent disclosure also relates to UV-protective microbial extracts thatmay be prepared from such engineered microbes or from microbes exposedto UV radiation. The disclosure further relates to methods using thesemicrobes or extracts, such as fermentation processes and methods ofprotecting agricultural plants or other materials from UV radiation.

UV-Protective Extracts

UV-protective microbial extracts of the present disclosure may be ableto wholly or partially block the passage of UV radiation. The extent towhich UV-radiation is blocked may depend on a variety of factorsincluding the microbial source, the amount of extract applied, and theformulation of the extracts.

The UV-protective extract may be prepared by exposing a microbe culture,such as a bacteria or yeast culture, to UV radiation, then extractingcomponents from the culture via centrifugation. The UV radiation may beof any wavelength, but in specific embodiments it may be short wave (254nm), long wave (365 nm), or a combination of both. In one embodiment, abacterial extract may be derived from Acidithiobacillus, particularly A.ferroxidans, after exposure of bacteria culture to UV radiation, foeexample for at least 72 hours. In another embodiment, a yeast extractmay be derived from S. cerevisiae or other yeast after exposure of yeastculture to UV radiation, for example for at least 48 hours. In stillanother embodiment, the extract may be prepared by culturing anengineered UV-resistant bacteria or yeast, such as a bacteria or yeastof the type described below, then extracting components from the culturevia centrifugation.

According to one embodiment, extracts of the present disclosure may beprepared by culturing an Acidithiobacillus, such as A. ferroxidans or byculturing S. cerevisiae or other yeast. Culture may proceed until dense,but not so dense as to trigger deleterious responses such as thosetriggered by lack of a food source. The culture may also not be so denseas to prevent UV radiation from reaching a substantial portion ofbacteria or yeast in the culture. The culture may then be irradiatedwith UV radiation. Prior to irradiation, the culture may be transferredto one or move vessels designed to allow a substantial portion of thebacteria or yeast to be irradiated. The wavelength of UV radiation maybe any wavelength, but in particular embodiments may be selected toinduce a radiation response in the bacteria or yeast. Similarly, thelength of exposure to the UV radiation may be any length from theminimal amount needed to induce a radiation response in at least somebacteria or yeast of the culture up to a length of time at which asubstantial portion of the bacteria or yeast in the culture are fatallyirradiated.

After irradiation, the bacteria or yeast may continue to be cultured fora time at least sufficient to allow some radiation response in thebacteria or yeast. If the bacteria or yeast were irradiated in a mannerthat causes death of a substantial portion of the bacteria or yeast,culture may cease after the majority of this bacterial or yeast deathhas occurred. Alternatively, if the bacteria or yeast were notirradiated in such a manner as to cause death of a substantial portionof the bacteria or yeast, culture may continue until such time as theradiation response has ceased in a substantial portion of the bacteriaor yeast.

Radiation response may include may include up-regulation in a yeast ofat least one of the following: a Msn4pn, a ruvB, a heat shock protein,such as a heat shock protein SSBI, an alcohol dehydrogenase (ADH)protein, a NADH-cytochrome b5 reductase 2, a NADP-specific glutamatedehydrogenase, a superoxide dismutase, a hexokinase protein, such ashexokinase 1, or a phosphate glycerate mutase. Radiation response mayinclude may include up-regulation in a bacterium of at least one of thefollowing: a major outer membrane protein, such as major outer membraneprotein 40, a RuBisCO large subunit 1 or 2, a phosphoribulokinase, aKetol-acid reductoisomerase, a pyridine nucleotide-disulfideoxoreductase, a methionine synthase, a hydromethyltransferase, aribosomal protein s2, or a methyltransferase. Radiation response mayadditionally or alternatively include down-regulation in a yeast of atleast one of the following: a protein disulfide isomerase, analpha-glucosidase MAL12, a methyl tetrahydropteroyl triglutamate, afructose-bisphosphate aldolase, or a glucokinase 1. Radiation responsemay additionally or alternatively include down-regulation in a bacteriumof at least one of the following: a Hsp 20, a caperonin, chaperoneprotein Dnak, or a Hsp 70.

It will be understood that up-regulation or down-regulation of one ormore of these proteins may not be directly responsible for UV-protectiveproperties, such that increased or decreased amounts of these proteinsin the extract may have little or no effect on its UV-protectiveproperties. Rather, up-regulation or down-regulation of one of theseproteins may have downstream effects that ultimately produce aUV-protective extract.

The extract may be prepared in manner able to isolate at least oneUV-protective component. In particular embodiments, the extract mayinclude centrifuged bacterial components. The extract may be formulatedat a variety of concentrations in any acceptable carrier to allow itsuse for a particular purpose. In particular embodiments, the extract maybe formulated in an evaporable carrier, such as water or alcohol, toallow the extract to dry on the surface of the material to be protectedfrom UV radiation.

In one example, the extract may be prepared by centrifuging the bacteriaor yeast culture in a manner able to precipitate most proteins, thendiscarding the supernatant while retaining the pellet as the extract.The pellet may then be used as is or dried. The pelleted material may bediluted to a given concentration using any acceptable carrier, such aswater or alcohol. The carrier may be non-denaturing. The carrier mayalso include materials to inhibit further bacterial growth and/orprotein degradation.

In an alternative example, the bacteria or yeast may not be pelletizedbut may instead be killed, for example by lysis or exposure to lethallevels of UV radiation, and the bacterial or yeast culture medium may beused as is or in an evaporated form. In this example materials toinhibit further bacterial or yeast growth and/or protein degradation mayalso be introduced.

In a further embodiment, isolated proteins from the bacteria or yeastculture may be used in place of a more general extract to produce theUV-protective effect. Such proteins may be isolated by further chemicalextraction.

Use of UV-Protective Extract

The extract may be applied to any material that may benefit from areduction in UV radiation. The exact formulation of the extract plus anycarriers may be adjusted based on the desired use. For example, theextract may be formulated with only non-toxic components if it is to beused on a human or animal or with another microorganism, such as in afermentation process or on an agricultural product. The extract may bemixed with other substances provide UV-protective properties to theoverall composition. Further, if coated on the material to be protected,the extract may itself be covered with a further protective coating toprotect, for example, against mechanical wear and damage.

The extract may be formulated or applied in such a manner as to blockapproximately 50%, 60%, 70%, 80%, 90%, 95%, or 99% of the UV radiationthat encounters the extract. The extract may also be formulated to blockthese percentages of particular UV wavelengths, or, more generally, toblock these percentages of longwave UV radiation or shortwave UVradiation.

Extracts according to the present disclosure may be used for a varietyof purposes. These purposes include, but are not limited to thefollowing:

-   -   1) blocking UV radiation or other types of radiation;    -   2) protecting human skin against damage and/or skin cancer        induced by UV radiation or other types of radiation;    -   3) protecting against side-effects of radiation used in cancer        treatments;    -   4) protecting animals from deleterious effects of UV radiation        or other radiation;    -   5) protecting plastic, glass, or other solid surfaces from UV        radiation or other radiation;    -   6) providing a UV radiation screen or screen for other types of        radiation;    -   7) protecting astronauts and/or other persons or organisms as        well as equipment during space trips;    -   8) enhancement of industrial fermentation processes or other        processes requiring energy by allowing the use of UV radiation        in connection with the process to supply additional energy and        thus to increase the ultimate energy-requiring output of the        cells, such as alcohol or a drug, without substantially killing        the fermenting organism;    -   9) protection of experimentation, fermentation, biochemical,        and/or biological processes under the presence of UV radiation,        for example in extraterrestrial conditions such as on the Moon        or Mars; and    -   10) protection of agricultural plants, particularly agricultural        plants in which the revenue-producing product is located        above-ground, such as fruits, vine-vegetables, beans and peas,        and leaf vegetables.

In one particular embodiment, an extract according to the presentdisclosure, particularly an A. ferroxidans extract, may be applied to afruit or vegetable, such as a watermelon or a tomato, during at least apart of its growth to increase the amounts of one or more nutrients ofthe fruit or vegetable, such as a vitamin, mineral, or other recommendeddietary component. In one specific example, the amount of lycopene maybe increased (which may be accompanied by a decrease in carotene orother less-valuable nutrients formed by competing pathways). In anotherspecific embodiment, the amount of a flavor-enhancing component, such asglucose, may be increased. In another specific embodiment, a componentbeneficial to the plant may be increased. For example, an increase inglucose helps protect against water loss.

The extract may be applied for approximately 25%, 50%, 75%, 90% or 99%of the fruit or vegetable's on-plant life, where the on-plant lifeincludes the time span from the formation of a separate body that willconstitute the fruit or vegetable (excepting flowers) until the fruit orvegetable is harvested. In a specific embodiment, the extract may befirst applied when the fruit or vegetable is sufficiently large to nolonger be substantially protected from UV radiation by leaves. Inanother specific embodiment, the extract may first be applied five days,one week, or two weeks prior to harvest. This embodiment may beparticularly useful with fruits or vegetables in which an increase in anutrient or flavor-enhancing component may be obtained by protecting thefruit or vegetable from UV radiation later in its on-plant life.

The extract may be applied once or multiple times to each fruit orvegetable. For example, it may be applied weekly, or it may be reappliedafter the fruit or vegetable is exposed to rain or after a turningprocess.

Application may be accomplished with a commercial sprayer. Applicationmay be only one the upper portions of the fruit or vegetable, which areexposed to substantially greater amounts of UV radiation than lowerportions of the fruit or vegetable.

UV-Resistant Microbes

According to another embodiment, a yeast or bacteria, particularly abeneficial yeast or bacteria such as one used in a fermentation process,may be engineered to be UV-resistant by transforming or transfecting theyeast or bacteria with a nucleic acid able to express a proteinup-regulated by UV-exposure or with a nucleic acid able to ultimatelycause a decrease in expression of a protein down-regulated byUV-exposure. These nucleic acids may be under the control of aconstitutive promoter or under control of a UV-inducible promoter.Particularly in embodiments in which the yeast or bacteria needs toperform another function, such as fermentation, the nucleic acids may beunder control of UV-inducible promoter so as not to impeded the otherfunction when UV protection is not required.

In one specific embodiment, a yeast may be transfected with a nucleicacid encoding at least one of the following: a Msn4pn, a ruvB, a heatshock protein, such as a heat shock protein SSBI, an alcoholdehydrogenase (ADH) protein, a NADH-cytochrome b5 reductase 2, aNADP-specific glutamate dehydrogenase, a superoxide dismutase, ahexokinase protein, such as hexokinase 1, or a phosphate glyceratemutase. In another embodiment, a bacterium may be transformed with anucleic acid encoding at least one of the following: a major outermembrane protein, such as major outer membrane protein 40, a RuBisCOlarge subunit 1 or 2, a phosphoribulokinase, a Ketol-acidreductoisomerase, a pyridine nucleotide-disulfide oxoreductase, amethionine synthase, or a methyltransferase.

Methods Using UV-Resistant Microbes

UV-resistant microbes may be used in fermentation processes, such as inthe production of alcohol or fuel ethanol, or in the production ofchemical and pharmaceutical products, including biological drugproducts.

EXAMPLES

The present disclosure may be better understood through reference to thefollowing examples. These examples are included to describe exemplaryembodiments only and should not be interpreted to encompass the entirebreadth of the invention.

Example 1 Bacteria Culture and UV Exposure

A. ferroxidans (ATCC 13598) was grown in ATCC liquid medium #2039 Brown,following the ATCC recommendations. ATCC liquid medium #2039 Browncontains different ingredients including minerals salts such as Fe (IIor III), Mg (II), Zn (II), Mn (II), Ca (II), Co (II), Cu (II), and othersolutions such as NaCl₂, Nitrilotriacetico acid, (NH₄)₂SO₄, AlK(SO₄)₂,H₃BO₃, Na₂MoO₄. The medium was prepared based on 1 liter volume. FiftymL of A. ferroxidans stock culture (1 month old) was transferred into 5liters of ATCC liquid medium #2039, as above described, in a 6 literflask. Two types of media were prepared, one containing Fe (II) and theother containing Fe (III), in addition to the other ingredients, asmentioned above. The flasks containing the A. ferroxidans cultures werecovered with a spongy stopper, thus allowing oxygen penetration, andincubated at room temperature for 12 days.

After 12 days of incubation, two liters of A. ferroxidans cultures weretransferred into OJO-sterilized glass trays (200 mL per each tray),aseptically. The trays containing the A. ferroxidans cultures wereexposed to UV radiation at a short wavelength, 254 nm or a longwavelength, 365 nm for 0, 12, 24, 48, 72, 96 or 120 hours. Differenttrays were used per different type of iron (Fe II or Fe III) and fordifferent lengths of time, as above described. Only two trays containingthe A. ferroxidans cultures were used at a time. An ultravioletfluorescent analysis cabinet (50 cm×50 cm×20 cm) (Spectroline modelcc-80) was used for the UV irradiation.

TABLE 1 indicates the effect of the short wave UV irradiation (254 nm)on growth of the bacterium A ferroxidans. The results show that growthof the bacterium A ferroxidans was not significantly affected by the UVradiation, even after 48 hours of exposure. In fact, the biomass of A.ferroxidans, although showing an initial decrease, rebounded and was notsignificantly decreased as compared to the initial biomass after 24hours of exposure to UV radiation. This biphasic growth is a typicalgrowth pattern for A. ferroxidans. When growth is slower new medium andadditional oxygen is typically required for growth to continue. Theoverall higher levels of biomass at 0.5 and 48 hours in the UV-exposedbacteria as compared to non-UV-exposed bacteria shows that the UV lightcan in fact provide additional energy to the fermentation process,allowing the bacteria to grow without the need for new medium oradditional oxygen, or with less frequent addition of new medium oradditional oxygen.

TABLE 1 Growth of Bacterium A. Ferroxidans (ATCC 13598) Under Exposureto UV Irradiation for Up To 2 Days Length of Bacterial Growth (biomassmg/L)³ Exposure No-UV (Control) UV² (Hour) Trials¹ Average TrialsAverage 0 250 + 250 + 250 250 250 + 250 + 250 250 0.5 100 + 50 + 100 83250 + 100 + 250 200 24 125 + 100 + 350 255 250 + 125 + 250 245 48  5 +5 + 130 13  20 + 100 + 250 155 ¹Three different trials were carried out.²A 254 nm λ UV radiation source was used. ³The weight (mg/L) wasobtained as a pellet from the bacterium.

Example 2 Extract Preparation

After the relevant period of time for each sample, the A. ferroxidansculture samples exposed to UV radiation were taken and subjected tocentrifugation at approximately 10,000×g (13,000 RPM) for 5 minutes at4° C. The centrifugation process was repeated three times for eachsample. The supernatant was discharged and the pellet was saved to beused immediately; otherwise, the pellet was kept at −25° C., until use.

The pellet was dried under vacuum in a lyophilizer at −40° C. andpulverized. The pulverized pellet was mixed with sterilized de-ionizedwater in order to obtain different concentrations of pellet material(0.05 g/mL, 0.10 g/mL, 0.15 g/mL, 0.20 g/mL, and 0.25 g/mL). 0.25 g/mLor higher concentrations of the extract may be preferable because moreextract material generally provides a greater protective effect.However, increases in protective effect may be negligible in some usesabove certain concentrations. Further, smaller concentrations may bedesirable in some uses, particularly if the extract has negativeside-effects in that use.

Example 3 UV Protection Testing

UV radiation is know to kill prokaryotic and simple eukaryotic cells.Accordingly, a decrease in cell death for these cells when exposed to UVradiation in the presence of a material indicates that the material is aUV protectant and blocks UV radiation. Cell death tests were performedusing prokaryotic cells such as Bacillus subtilis (wild type isolatedfrom the Prairie View A&M University farm), Staphylococcus aureus (ATCC6538), Salmonella typhimurum (ATCC 14028), and eukaryote cells such asSaccharomyces cerevisiae (ATCC 66348).

The bacterial cells were grown in nutrient broth and/or nutrient agarplates (Difco, Detroit, Mich.) and the yeast cells were grown in yeastextract nutrient broth and/or agar plates. The microbial cultures wereincubated at 30° C., and used after 24 hours for bacteria and after 48hours for yeast. Microbial cells were used during exponential growth,and their population was measured by optical density reading (O.D.) at600 nm. Different O.D. were used (0.3, 0.5, 0.8, and 1.0), however, 0.5was preferred because cells were in exponential growth at this OD andnot near the end of it.

From each bacterial solution, different fresh dilutions (10, 100, 1,000,10,000, and 1,000,000 cells/mL) were prepared, but 10,000 cells/mLdilution was preferred because it assured sufficient cell density, butdid not reach non-exponential growth stages too early. Twenty mL fromeach dilution were separately transferred to sterile 9 cm Petri plates.Three replicates for each bacterial or yeast dilution were exposed toshortwave (254 nm) or longwave (350 nm) UV radiation for differentlengths of time (15, 30 or 60 minutes). However, bacterial or yeastexposure to shortwave UV radiation for 60 minutes was preferred becauseit represents harsher conditions that longwave radiation and shortertime periods. Shortwave UV radiation is known to be more lethal to mostorganisms than longwave UV radiation. Bacterial or yeast cultures wereexposed alone (control) or in mixture with the pulverized A. ferroxidanspellet extract from Example 2 (treatment). Different concentrations ofthe extract (0, 150, 200, or 250 mg/mL) were used. However, 250 mg/mLwas preferred and was used to obtain the data presented in TABLES 2-4.The mixture was always well stirred in order to ensure complete mixingof the bacterial or yeast cells with the extract. In addition to control(bacteria or yeast alone), different types of extract treatments wereused:

1) Bacillus subtilis (wild type)2) B. subtilis+Extract of A. ferroxidans (from 4-week-old culture)3) B. subtilis+Extract of A. ferroxidans (from 2-week-old culture)4) Salmonellas typhimurum (ATCC 14028)5) S. typhimurum (ATCC 14028)+Extract of A. ferroxidans (from 4 week-oldculture)6) S. typhimurum ATCC 14028+Extract of A. ferroxidans (from 2 week-oldculture)7) Staphylococcus aureus (ATCC 6538)8) S. aureus (ATCC 6538)+Extract of A. ferroxidans (from 4-week-oldculture)9) S. aureus (ATCC 6538)+Extract of A. ferroxidans (from 2-week-oldculture)10) Saccharomyces cerevisiae (ATCC 66348)11) S. cerevisiae (ATCC 66348)+Extract of A. ferroxidans (from 4week-old culture)12) S. cerevisiae (ATCC 66348)+Extract of A. ferroxidans (from 2week-old culture)13) C. albicans14) C. albicans+Extract of A. ferroxidans

After exposure of the liquid microbial cultures to UV irradiation, 1 mLof the UV-irradiated microbial dilutions (10,000 cells/mL) was placedinto the center of a sterile Petri dish, and agar media (nutrient agarfor bacterial cultures or yeast extract agar for yeast) was poured intothe Petri dish, thus following the standard pour plates technique. Twodifferent size of Petri dishes were used: 1) standard plain 9 cmdiameter, and 2) a 9 cm diameter Petri dish divided into three equalareas. A minimum of six replicates per dilution were made. The microbialcultures were immediately incubated at 30° C. Microbial growth wasdetermined and counted after 24, 48, 60, and 72 hours and after oneweek. Microbial growth was determined by using the standard counting ofthe number of colony forming units (CFU) of the UV-irradiated ornon-irradiated microbial cultures.

The results as indicated in TABLES 2-4 clearly demonstrate the UVprotection that A. ferroxidans extract provides to S. cerevisiae, C.albicans, and B. subtilis. Similar results were obtained using the otherorganisms in the list above.

TABLE 2 shows prolific growth of S. cerevisiae in all the plates withyeast culture that were also previously treated with the extract of A.ferroxidans, and exposed to UV radiation for 1 hour, and later incubatedat 30° C. for 72 hours. All plates were fully covered by the yeast. Incontrast, yeast cultures that were not treated with the extract of A.ferroxidans did not show substantial growth at all, thus indicating thatthe cells were not protected from the UV radiation and were killed. Thisindicates that the extract of A. ferroxidans is able to protecteukaryote cells such as yeast cells from UV damage. Therefore, theextract of A. ferroxidans should be effective to protect other eukaryotecells such as mammalian cells against UV radiation.

TABLE 2 Protection Against UV Radiation by A. Ferroxidans Extract inCultures of S. Cerevisiae Colony Count Treatment Plate 1 Plate 2 Plate 3Mean STDEV SAC³ only (control) FC¹ FC FC N/A N/A Sac + UV 0 0 1 0.330.58 SAC + EAF² FC FC FC N/A N/A SAC + EAF + UV FC FC FC N/A N/A ¹FC =Agar plates fully covered by microbial growth. ²EAF = Extract fromAcidithiobacillus ferroxidans. ³SAC = Saccharomyces cerevisiae.

TABLE 3 and FIG. 4 show the protective effect A. ferroxidans extractagainst UV radiation in a different yeast, C. albicans. The A.ferroxidans extract gave full protection to C. albicans growing at 30°C. for 72 hours. C. albicans with A. ferroxidans extract was exposed toUV radiation for 1 hour, then incubated at 30° C. for 72 hours and no UVradiation. The yeast grew as much (95-100%) as the non-UV treated yeastcultures. However, all UV-treated cultures without the protective A.ferroxidans extract showed no growth at all. This corroborates theprotective effect of the A. ferroxidans extract against UV radiation ina different eukaryotic cell, C. albicans.

TABLE 3 Protection Against UV Radiation by A. Ferroxidans Extract inCultures of C. Albicans Colony Count Treatment Plate 1 Plate 2 Plate 3Mean STDEV CA¹ only (control) 103 91 89 94.33 7.57 CA + UV 0 0 0 0.000.00 CA + EAF² 101 94 104 99.67 5.13 CA + EAF + UV 92 107 82 93.67 12.58¹CA = Candida albicans. ²EAF = Extract from Acidithiobacillusferroxidans.

TABLE 4 shows the marked protective effect of A. ferroxidans extractagainst UV radiation in a prokaryote cell such as Bacillus subtilis. Theresults show great growth of the bacterium fully covering the plates inthose cultures treated with the A. ferroxidans extract, as compared tothose plates that were not treated and which showed no bacterial growth.All plates were exposed to UV irradiation for 1 hour and then incubatedwithout UV radiation for 72 hours. These results indicate the efficacyof A. ferroxidans extract in protecting bacterial cells as well.

TABLE 4 Protection Against UV Radiation by A. Ferroxidans Extract inCultures of B. Subtilis Colony Count Treatment Plate 1 Plate 2 Plate 3Mean STDEV BS only (control) FC¹ FC FC N/A N/A BS² + UV 0 2 0 0.67 1.15BS + EAF³ FC FC FC N/A N/A BS + EAF + UV FC FC FC N/A N/A ¹FC = AGARPlates fully covered. ²BS = Bacillus subtilis.3-EAF=Extract from Acidithiobacillus ferroxidans.

Example 4 Effects of UV Protective Agent on S. Cerevisiae StressResponse Gene Expression

The effects of the A. ferroxidans extract to protect yeast against UVdamage were further confirmed by evaluating the expression of fivegenes, which encode zinc finger proteins, known to be involved inchromosomes repair, after exposure to damage by different stressingfactors including UV radiation. The genes were expressed in S.cerevisiae (ATCC 66348). The semi-quantitative real time polymerasechain reaction (qRT-PCR) was used for analysis.

S. cerevisiae previously treated with the A. ferroxidans extract weregrown for 2-4 days in liquid cultures at 26-30° C. see as describedabove. Control cell were not treated with the A. ferroxidans extract.Two hundred mL of yeast cultures were grown in 500 ml flasks, each,under shaking conditions (350 RPM). Six replicates were used for eachyeast culture. After 2-4 days incubation, cells were harvested andsubjected to centrifugation to obtain a pellet. Fifty mL of yeastculture sample were used in four replicates each. Cells were centrifugedthree times at 15,000 RPM, under refrigeration (4° C.) for 10 minutesthree times. Cells were harvested as pellets, and the pellets were keptunder freezing conditions (−80° C.) or used immediately for furtheranalysis.

For each pellet, the quantity and quality of the total RNA wasdetermined by UV spectroscopy, using the a NanoDrop™ spectrophotometer.cDNA was synthesized from total RNA with a combination of randomhexamers and oligo dT and Superscript III®. cDNA was also synthesizedwith oligo dT only and Superscript II®. After cDNA synthesis, the RNAwas digested with RNase H. SYBR green was used for real time detectionof the PCR products in the 7900HT Sequence Detection System.

PCR amplification primers were designed for each gene of interest, asfollows:

S. cerevisiae primers Amplicon gene (listed 5′ to 3′) Size dnaX-FTGGAAGCTGAAGCCGGG 122 (SEQ ID NO. 1) dnaX-R AGAAACAAGAGCAATTTTTCCCC(SEQ ID NO. 2) Msn4p-F CGAAAGTGGCGACTACAGGC 111 (SEQ ID NO. 3) Msn4p-RATATTCATTTGATGATGATGGA AAGATCG (SEQ ID NO. 4) recA-F TACGGATTTTTCTGGTGG101 (SEQ ID NO. 5) recA-R CTGCAACACCAAATTGGTCG (SEQ ID NO. 6) ruvB-FGCAGTTACGAGAACTGCGGC 91 (SEQ ID NO. 7) ruvB-R CAACAAACCCTCCTTCAACCC(SEQ ID NO. 8) GAPDH-F AACACCCATGACGAACATTGG 81 (SEQ ID NO. 9) GAPDH-RCAAAAGCACATTGACGCTGG (SEQ ID NO. 10)

Conditions were developed for the amplification of each target gene byRT-PCR using genomic DNA as a template. The expression level of eachgene including GAPDH was determined from each sample in triplicate. Areference standard curve for each gene was generated and each point wasmeasured in triplicate. Positive controls using genomic DNA and negativecontrols with cDNA synthesis reactions where the reverse transcriptasewas omitted and water only were included in assays. Samples wereamplified in the 7900HT Sequence Detection System at 95° C. for 10 min.followed by 50 cycles at 95° C. for 30 sec., 60° C. for 30 sec., and 72°C. for 30 sec. Fluorescence measures were made at the end of eachextension cycle. Following PCR amplification, a melting curve analysiswas performed by heating the samples at 95° C. for 15 sec., and 95° C.at 1 C/min.

After PCR amplification and melting curve analysis, a Ct value wascalculated for each sample. The relative amount of RNA was determinedcomparing the Ct value of the test samples to the control sample afternormalization with GAPDH. Ct values for any given sample were only usedif their value fell within the standard curve for each gene. Otherwise,the assay was repeated and the test sample (i.e. cDNA) was diluted.

Several methods were tested for isolating and purifying total RNA fromS. cerevisiae. These methods include the RNAeasy Mini Kit™ (Qiagen), TRIReagent™ (Sigma), Master Pure Complete DNA and RNA Purification Kit™(Epicentre Biotechnologies Inc.), hot phenol:chloroform:isoamyl (Sigma)and modifications of some of these protocols. The following modifiedRNAeasy™ protocol was successfully used to isolate total RNA from S.cerevisiae.

Frozen cellular pellets were thawed, thoroughly mixed with 2-3 volumesRNA Protect™ (Qiagen) and incubated for 10 min. at 23° C. Cells werecentrifuged at 5,000×g for 10 min at 23° C. Supernatant was decanted anddiscarded. Cell pellets were resuspended in 200 ul 15 mg/mL lysozyme and1.5 mg/mL proteinase K in 10 mM TRIS-HCl (pH 7.4) and 1 mM EDTA. Cellswere incubated for 10 min. at 23° C. Seven hundred μL RLT buffer wereadded and mixed by vortexing. Samples were sonicated for 1 min. Fourhundred seventy μL ethanol were added and mixed by vortexing. Thesolution ws applied to a resin spin-column. The spin-column wascentrifuged at 8,000×g for 10 sec. at 23° C. Flow-through was discarded,and the remaining solution was added and centrifuged as above. Eighty μLof DNase solution was applied (70 μL RDD buffer and 10 μL DNase) to thespin-column and incubated for 15 min. at 23° C. Three hundred and fiftyμL RW1 buffer was applied to the spin-column solution. The spin-columnsolution was centrifuged at 8,000×g for 1 min. at 23° C. Flow-throughwas discarded. Five hundred μL RW1 was applied to the spin-column. Thespin-column was centrifuged at 8,000×g for 1 min. at 23° C. Flow-throughwas discarded. Use of the spin-column was repeated. The spin-column wastransferred into a new collection tube and centrifuged at 8,000×g for 1min. at 23° C. The spin-column was transferred into a new collectiontube. Fifty μL of RNase-, DNase-free water was added to the center ofthe spin-column and left at 23° C. for 1-2 min. The spin-column wascentrifuged at 8,000×g for 1 min. at 23° C. The flow-through was saved,because it contained the RNA. The quantity and quality of the RNA wasevaluated by absorbance spectroscopy and agarose gel electrophoresis.

After RNA was isolated from the cells, the samples were analyzed forgene expression by RT-PCR, as described above. cDNA was synthesized witholigo dT, as described above. A Northern Blot showed that stressresponse genes were not significantly up-regulated after UV exposure inS. cerevisiae previously exposed to the A. ferroxidans extract. Nosignificant differences were seen in the total RNA for the cells.

Differences in expression for Msn4pn and ruvB, which are involved inchromosome repair after stress-related damage, were observed betweensamples of S. cerevisiae treated with the A. ferroxidans extract andthose not treated after the samples were exposed to UV radiation asdescribed above.

Results of further experiments regarding stress-response gene expressionin S. cerevisiae are shown in TABLE 5. In TABLE 5, “SA” designatescontrol S. cerevisiae that were not treated with bacterial extract andnot exposed to UV radiation. “S5” designates S. cerevisiae treated withbacterial extract and exposed to UV radiation for 48 hours. “S6”designates S. cerevisiae treated with bacterial extract and exposed toUV radiation for 72 hours.

TABLE 5 Stress-Response Gene Expression in S. cerevisiae Msn4p (Ct) recA(Ct) ruvB (Ct) GAPDH (Ct) SA (1:50 cDNA) - 1 35.015858 31.09976234.97601 25.63601 SA (1:50 cDNA) - 2 34.556225 31.193922 34.4332225.67667 SA (1:50 cDNA) - 3 34.61304 31.48071 33.99136 25.86641 SA (1:50cDNA) - 34.7 31.3 34.5 25.7 Mean SA (1:50 cDNA) - 0.25 0.20 0.49 0.12Std. Dev. SA (1:50 cDNA) - 0.14 0.11 0.28 0.07 Std. Error S5 (1:50cDNA) - 1 48.143795 36.857708 39.42146 33.32396 S5 (1:50 cDNA) - 238.14609 37.113995 40.3668 32.55367 S5 (1:50 cDNA) - 3 39.8343736.967648 39.43715 33.174426 S5 (1:50 cDNA) - 42.0 37.0 39.7 33.0 MeanS5 (1:50 cDNA) - 5.35 0.13 0.54 0.41 Std. Dev. S5 (1:50 cDNA) - 3.090.07 0.31 0.24 Std. Error S6 (1:50 cDNA) - 1 34.409473 31.55284534.38703 25.48201 S6 (1:50 cDNA) - 2 34.430233 31.288467 34.809925.45857 S6 (1:50 cDNA) - 3 35.021397 31.782907 34.67211 25.69369 S6(1:50 cDNA) - 34.6 31.5 34.6 25.5 Mean S6 (1:50 cDNA) - 0.35 0.25 0.220.13 Std. Dev. S6 (1:50 cDNA) - 0.20 0.14 0.12 0.07 Std. Error S5 (1:5cDNA) - 1 38.55734 32.21721 37.2342 30.968388 S5 (1:5 cDNA) - 237.911972 32.550484 37.835094 30.854069 S5 (1:5 cDNA) - 3 37.2346133.667084 40.251022 30.989134 S5 (1:5 cDNA) - 37.9 32.8 38.4 30.9 MeanS5 (1:5 cDNA) - 0.66 0.76 1.60 0.07 Std. Dev. S5 (1:5 cDNA) - 0.38 0.440.92 0.04 Std. Error S6 (1:5 cDNA) - 1 35.528088 32.005764 35.44663226.329565 S6 (1:5 cDNA) - 2 35.120403 31.908882 36.131447 26.248236 S6(1:5 cDNA) - 3 35.390247 31.86025 35.302666 26.37515 S6 (1:5 cDNA) -35.3 31.9 35.6 26.3 Mean S6 (1:5 cDNA) - 0.21 0.07 0.44 0.06 Std. Dev.S6 (1:5 cDNA) - 0.12 0.04 0.26 0.04 Std. Error

Example 5 Identification of Protein Expression Changes in S. Cerevisiaeain Response to UV Radiation

Yeast cells were grown in yeast extract agar media at 28-30° C.,overnight, following microbiological standard procedures. The best growncolonies were selected to make culture dilutions, which were used as asource of inoculum in liquid culture. Different yeast dilutions werethen made, and their concentrations were measured according to theabsorbance (optical density=O.D) at 550-600 nm wavelength). Differentdilutions were used: 0.05, 0.02, 0.01, 0.0005 O.D. However, dilution0.01 O.D was preferable.

Yeast cultures were then exposed to UV radiation for 48 hours anincubated at 28° C., then samples were taken to determine proteinexpression. Samples were taken and mixed with phosphate buffer salinesolution (PBS), pH 7.4 following standard procedures (Sambrook, F., andManiatis. 1989. Molecular cloning: A laboratory manual. 2nd edition,Cold Spring Harbor Laboratory Press. Cold Spring Harbor, N.Y. Volume 3,appendix B, 12; Medicago AB. 2009.) The mixture of yeast culture and PBSwere subjected to centrifugation at 4° C. at 1500 RPM for 5 minutesthree times, and the supernatants were discarded each time. One gram offinal pellets were stored at −80° C. until use, otherwise, the pelletswere used immediately. Two samples were used for analysis bytwo-dimensional difference gel electrophoresis (2D DIGE) and proteinidentification by liquid chromatography tandem mass spectrometry(LC-MS/MS). Six proteins with increased or decreased expression areidentified in TABLE 6.

TABLE 6 S. Cerevisiaea Proteins Up-Regulated or Down-regulated by UVExposure Protein Accession # Change Heat shock protein SSB1 P10591.4 GI:417149 Increased Protein disulfide isomerase P17967.2 GI: 129732Decreased Alpha-glucosidase MAL12 P53341.1 GI: 1708906 Decreased Methyltetrahydropteroyl triglutamate P05694.4 GI: 730018 DecreasedNADH-cytochrome b5 reductase 2 P36060.1 GI: 549725 IncreasedNADP-specific glutamate P07262.2 GI: 2506355 Increased dehydrogenaseSuperoxide dismutase P00447.1 GI: 134681 Increased Hexokinase 1 P04806GI: 1170444 Increased Fructose-bisphosphate aldolase P14540.3 GI: 113626Decreased Phosphate glycerate mutase P00950.3 GI: 548534 IncreasedGlucokinase 1 P17709.1 GI: 123899 Decreased

Example 6 Identification of Protein Expression Changes in A. ferroxidansin Response to UV Radiation

A culture of A. ferroxidans was exposed to UV radiation for 72 hours.Samples were taken and analyzed for protein as described in Example 5.Results are presented in TABLE 7.

TABLE 7 A. ferroxidans Proteins Up-Regulated or Down-regulated by UVExposure Protein Accession # Change Major outer membrane protein 40CAA10107.1 Increased RuBisCO large subunit 1 P0C916.1 Increased RuBisCOlarge subunit 2 P0C917.1 Increased Phosphoribulokinase ACK78673.1Increased Ribosomal protein S2 ACK79803.1 Increased Ketol-acidreductoisomerase B5EP52.1 Increased Pyridine nucleotide-disulfideACK80497.1 Increased Hsp20 ACK78444.1 Decreased Methionine synthaseB5ELU7.1 Increased Serine hydroxymethyltransferase ACK78912.1 IncreasedChaperonin ACK77997.1 Decreased HSP70 B5ENA3.1 Decreased

Example 7 Identification of cDNA Changes in A. ferroxidans in Responseto UV Radiation

A culture of A. ferroxidans was exposed to UV radiation for 72 hours.Samples were centrifuged to prepare pellets, which were frozen. Pelletswere subject to Real Time PCR.

Primers and genes thus identified were as follows:

Amplicon Gene Size Forward primer (5′-3′) Reverse Primer (5′-3′) ccbL2117 GCCGGAAGCTGGGATGCACA GAAGCGCACCGTGGCCTGAT (P0C917.1) (SEQ ID No. 11)(SEQ ID No. 12) cbbP 94 CAGCGCACCTGGCACCTTCA GCCCGTCTTCACGCCACCAT(ACK78673.1) (SEQ ID No. 13) (SEQ ID No. 14) rpsB 100CACGGCGCTCAGCTTTGTCG AGCTTCCTGCTCGACGGCCT (ACK79803.1) (SEQ ID No. 15)(SEQ ID No. 16) AFE_2086 126 CCCCTGGATGGTAAGCACCCCT GATTGGTCGCCCCGCGTTGA(CK78444.1) (SEQ ID No. 17) (SEQ ID No. 18) metE 158TGGTGGGGAAGGCAGGCAGT AGCCGTCGCCTCACGCAAAA (B5ELU7.1) (SEQ ID No. 19)(SEQ ID No. 20) glyA 71 GGACCGTGCGCTGGAGCTTT GATTGGCCTGCGAGCCGGAA(ACK78912.1) (SEQ ID No. 21) (SEQ ID No. 22) groES 83ATGGCCGGCAGCGACGATTT AGCAGAAGACTGCCGGTGGGA (ACK77997.1) (SEQ ID No. 23)(SEQ ID No. 24) dnaK 138 GGCGCGGGTCAGCTTCATGT GCCATGCAGCGCCTGAAGGA(B5ENA3.1) (SEQ ID No. 25) (SEQ ID No. 26) gap 128 TTTCTTGGCGCCGCCCTTGATGCTTGCCGAACGCGATCCT (ACK78716.1) (SEQ ID No. 27) (SEQ ID No. 28) rpoC83 TGTCGCTGGAGGCGCAGTTG AACGGGCTCACCATTGGCCG (ACK80911.1)(SEQ ID No. 29) (SEQ ID No. 30)

cDNA levels for ccbL2 (ribulose bisphosphate carboxylase, large subunit2, abbreviated RuBisCO sumunit 2) and metE (methyltransferase),increased by 20% following UV-exposure. cDNA levels for dnak (chaperoneprotein Dnak), glyA (serine hydromethyltransferase) and rpsB (ribosomalprotein s2) decreased by between 60% and 70%.

Example 8 Transfection of S. Cerevisiaea to Increase UV-Resistance

S. Cerevisiaea were transfected with the plasmid shown in FIG. 1 (3genes), with a similar plasmid containing only HSP70, ADH, orhesokinase, or with an identical plasmid lacking the riboswitchcomponent (3 genes −). Transfected yeast cells were grown in yeastextract agar plates at 28-30° C., overnight. Culture solutions were madeand inoculated into 250 ml yeast extract liquid media contained in a 1liter sterile glass bowl. Thus, the initial working concentration of theyeast cells cultures were equivalent to an optical density (O.D) of 0.07at 600 nm. pH of cultures were adjusted to 4-4.5; the experiments wereset up in triplicates. The yeast cultures were incubated under alternateregimes of 12 hours of no-UV radiation and 48 hours of UV-radiation (254nm), and continued shake (300 RPM), a total of 60 hours incubation at28-30° C. Incubation was completely covered and protected against anykind of light from outside. Markers of cell growth were measured andresults are reported in TABLE 8. Control yeast were not transfected.

TABLE 8 Growth Markers in UV-Resistant S. Cerevisiaea RNA Sample UV ODDNA (ng/μL)* (ng/μl)* ATP (RLU) 3 genes Y 1.108  154 ± 8.2 120.9 ± 6.8 93 ± 9 3 genes N 0.580 53.5 ± 2.8 19.4 ± 1.1 115 ± 20 3 genes - Y 1.21785.5 ± 1.2 60.8 ± 3.1  89 ± 17 3 genes - N 0.571 19.7 ± 1.5  5.5 ± 1.2 97 ± 12 HSP70 Y 1.119 98.5 ± 0.2 117.2 ± 2.3  105 ± 13 HSP70 N 0.564 9.7 ± 0.85 15.8 ± .92 120 ± 17 ADH Y 1.109  126 ± 5.1 110.2 ± 3.1  121± 14 ADH N 0.601  5.7 ± 1.2 24.5 ± 0.5 155 ± 12 Hexokinase Y 1.098   84± 4.2 80.5 ± 1.5  81 ± 22 Hexokinase N 0.519 7.2 ± 1   7.8 ± 1.15  57 ±11 Control Y 0.532 80.2 ± 2.5 42.3 ± 1.4  87.9 ± 12.1 Control N 0.435 8.9 ± 1.4 14.3 ± 1.7 102 ± 15 *Mean +/− standard deviationOD—Optical density; ATP—Adenosine triphosphate; RLU—Relativeluminescence units

Example 9 Fermentation Using UV-Resistant S. Cerevisiaea

S. Cerevisiaea were transfected with the plasmid similar to that of FIG.1, containing only HSP. Yeast were cultured and then exposed to UVradiation for 48 hours. Fermentation products in the yeast were thenmeasured using HPLC. Results for glucose production are shown in TABLE9.

TABLE 9 Glucose Production in UV-Resistant S. Cerevisiaea Sample UVGlucose (g/L) HSP + Yeast Y 63.92 +/− 7.92 HSP + Yeast N 606.32 +/−72.10 Control Y 0 Control N 0Increased inositol production was also observed.

Example 10 Protection of Watermelons from UV Damage by A. ferroxidansExtract

An extract was prepared from an A. ferroxidans culture previouslyexposed to UV-radiation for 72 hours. Sans Pepins wateremelon fruitswere cleaned in sterile water and dried with a paper towel. Thewatermelons were then coated with different concentrations of bacterialextract (0.1, 0.2, 0.5, 0.7 and 1%) using a small brush or by sprayinguntil their entire surfaces were covered. Watermelons were then placedin a Percival environmentally-controlled chamber (Percival Scientific,Perry, Iowa) and exposed to 254 nm or 360 nm UV radiation at atemperature of 27-29° C. and 85% relative humidity for two weeks.Control watermelons coated with water were also tested.

Watermelons were assed for color and shape of the fruit rind, blisteringof the watermelon fruit, color and ripening (texture) of the flesh ofthe fruit, and content of glucose, carotene, and lycopene.

Flesh color was assigned the following values: 1=pale, 2=pale red,3=medium red, 4=dark red.

Firmness (textures) was assigned the following values: 1=hard, 2=mediumhard, 3=soft, 4=very soft.

Blistering was assigned the following values: 0%=no blistering, 1=10%blistering, 2=25% blistering, 3=50% blistering, 4=75-100% blistering.

Rind color was assigned the following values: 1=very dull green, 2=dulllight green, 3=medium green, 4=very (bright) green

Glucose, carotene, and lycopene content were determined using HPLC.

Results are presented in TABLES 10 and 11.

TABLE 10 Effects of Extract on Watermelon Color, Blistering, FleshColor, and Flesh Texture Sample Rind Color Blistering Flesh Color FleshTexture Extract + UV 4 0 3 3 Water + UV 2 2 2 4

TABLE 11 Effects of Extract on Watermelon Glucose, Lycopene, andCarotene Content Sample Glucose (g/L) Carotene (mg/L) Lycopene (mg/kg)Extract + UV 13.00 +/0.90  20.40 +/− 1.64 47.87 +/− 5.14 Water + UV12.07 +/− 0.75 45.17 +/− 7.73 27.07 +/− 3.64

Example 11 Protection of Fibroblasts from UV Damage by S. CerevisiaeaExtract

S. Cerevisiae cells were transfected with the plasmid of FIG. 1.Extracts of these yeast were applied to fibroblast cultures (which areindicative of skin protection), which were then exposed to UV radiation.Fibroblast cells were then stained for indicators of apoptosis (stainingmethod differentiates between live and dead cells) and cell numbers werecounted using microscopy. Control samples were not treated or weretreated with extract from non-transfected yeast. Results are presentedin TABLE 12.

TABLE 12 Effects of Extract on Fibroblast Resistance to UV-Radiation %Sample UV Apoptosis Cell count Fibroblasts N 0 15 alive, 1 deadFibroblasts Y 78.7 18 alive, 7 dead Fibroblasts + Transfected Extract Y0 18 alive, 2 dead Fibroblasts + Non-transfected Y 0 17 alive, 4 deadExtract

Example 12 Solubility and Toxicity Data

Extracts from S. Cerevisiae and A. ferroxidans were tested to determinetheir solubility in water and their toxicity. Results are presented inTABLE 13.

TABLE 13 Solubility and Toxicity Data Solubility Toxicity Extract mg/ml(LD₅₀) mg/Kg S. ceresiviae + no UV 0.05 88.3-100 S. ceresiviae + UV0.015 100 A. ferroxidans + UV 0.15 100

Water solubility may be important for various reasons depending on theuse. For example, in methods where the extract is applied to a fruit orvegetable, good water solubility means that the extract should belargely removed when the fruit or vegetable is washed, decreasing therisk of any safety hazards for consumers. Good water solubility alsoindicates that keeping the extract in solution and thereby benefitingfrom its protective effects during a fermentation process may be easier.

Toxicity is significant because it indicates the likelihood of anyadverse effects from the extracts if they are consumed. A high LD₅₀value indicates that more of the extract may be consumed without adverseeffects. In general, the extract may be used so that the amount presenton a fruit or vegetable or in portion of a fermentation producttypically consumed is less than the LD₅₀.

Although only exemplary embodiments of the invention are specificallydescribed above, it will be appreciated that modifications andvariations of these examples are possible without departing from thespirit and intended scope of the invention. For example, throughout thespecification particular measurements are given. It would be understoodby one of ordinary skill in the art that in many instances particularlyoutside of the examples other values similar to, but not exactly thesame as the given measurements may be equivalent and may also beencompassed by the present invention. As another example, although onlymonocultures of particular microbes are described herein for extractproduction, it will be understood that co-cultures are possible and mayprovide the benefit of different sources of UV-blocking components inthe same extract.

1. A composition comprising an extract from an Acidithiobacillusbacteria or a yeast extracted after exposure of the bacteria to UVradiation.
 2. The composition of claim 1, wherein the Acidithiobacillusbacteria comprises A. ferroxidans.
 3. The composition of claim 1,wherein the yeast comprises S. Cerevisiaea.
 4. The composition of claim1, wherein the extract blocks at least approximately 50% of UVradiation.
 5. The composition of claim 1, wherein the extract blocks atleast approximately 50% of longwave UV radiation.
 6. The composition ofclaim 1, wherein the extract blocks at least approximately 50% ofshortwave UV radiation.
 7. The composition of claim 1, wherein theconcentration of the extract is between approximately 0.05 g/mL and0.025 g/mL.
 8. The composition of claim 1 further comprising a carrier.9. The composition of claim 7, wherein the carrier comprises water. 10.A method of preparing a UV-blocking composition comprising: exposing aculture of Acidithiobacillus or yeast to UV radiation; and extractingUV-blocking cellular material produced in response to the UV radiationfrom the Acidithiobacillus or yeast.
 11. The method of claim 10, whereinthe Acidithiobacillus comprises A. ferroxidans.
 12. The method of claim10, wherein the yeast comprises S. Cerevisiaea.
 13. The method of claim10, wherein the culture of Acidithiobacillus or yeast is exposed to UVradiation for a length of time not sufficient to substantially kill theAcidithiobacillus or yeast in the culture.
 14. The method of claim 10,wherein extracting comprises centrifuging the Acidithiobacillus or yeastculture under conditions sufficient to precipitate UV-blocking cellularproteins.
 15. A method of protecting an item from UV radiation damagecomprising: extracting UV-blocking cellular material fromAcidithiobacillus or yeast exposed to UV radiation; and covering theitem with the UV-blocking cellular material.
 16. The method of claim 15,wherein covering comprises applying a liquid containing the UV-blockingcellular material to the item.
 17. The method of claim 15, whereincovering comprises mixing the UV-blocking cellular material with theitem.
 18. The method of claim 15, wherein covering comprised placing asolid material containing the UV-blocking cellular material over theitem.
 19. The method of claim 16, wherein the item comprises anagricultural product.
 20. The method of claim 16, wherein the itemcomprises human skin.